報告時間：2025年1月12日（星期日） 15:00-16:00
報告地點：科技樓516報告廳
報 告 人：Steve Shu Associate Professor
工作單位：澳大利亞悉尼大學EUV納米測量研究中心
舉辦單位：儀器科學與光電工程學院
報告簡介：
Next-generation nano- and quantum devices have increasingly complex 3D structure. As the dimensions of these devices shrink to the nanoscale, their performance is often governed by interface quality or precise chemical or dopant composition. Here, we present the first phase-sensitive extreme ultraviolet imaging reflectometer. It combines the excellent phase stability of coherent high-harmonic sources, the unique chemical sensitivity of extreme ultraviolet reflectometry, and state-of-the-art ptychography imaging algorithms.
報告人簡介：
Steve Shu is an Associate Professor at the School of Electrical and Computer Engineering in The University of Sydney. He received his B. Eng degree from Shanghai Jiaotong University in 2002, M.Eng from Nanyang Technological University in 2004, and Ph.D from The University of Melbourne in 2007, all in electrical and electronic engineering. Before returning to academia, he had worked more than a decade in the microelectronics industry (e.g., microelectronics research institute IMEC, the world's leading semiconductor equipment supplier ASML in Netherlands).
